- J.D., Catholic University of America, 2014, cum laude
- Ph.D., National Tsing Hua University, 2000
- M.S., National Tsing Hua University, 1996
- B.S., National Tsing Hua University, 1994
- District of Columbia
- United States Patent and Trademark Office
Dr. Charles Huang is an associate in the Intellectual Property in the firm's Washington, D.C. office.
Areas of Practice
Charles's practice focuses on patent prosecution and enforcement. He prepares and prosecutes hundreds of patent applications in the areas of semiconductors, LEDs, displays, wireless communications, robotics, software, cloud computing, artificial intelligence, and optical devices. He also participates in litigation in district courts and at the U.S. International Trade Commission (ITC), and proceedings before the U.S. Patent and Trademark Office. Dr. Huang counsels clients on portfolio management, due diligence, and patent invalidity and infringement issues.
Prior to law practice, Charles worked as an intellectual property manager for liquid crystal display manufacturing companies in Taiwan and mainland China. In those positions, he was responsible for analyzing several LCD-related patent portfolios, supervising litigations relating to U.S. patent rights, and negotiating patent acquisitions. He previously served as a senior engineer in support of the development of wide viewing angle LCDs, laser cutting, backlight technology, amorphous and polysilicon TFTs, driving circuitry, and OLEDs, including OLED material evaluation, electrode and pixel designs, and driving schemes.
Charles obtained his Ph.D. in materials science, with particular focus on optoelectronic devices and related semiconductor technologies. He is particularly knowledgeable regarding the interpretation of analytical results obtained from instruments employed in materials science research. He served as chief assistant, instrument center, at Taiwan’s National Science Counsel, with responsibility for operating an atomic resolution electron microscope. His graduate research at National Tsing Hua University related to the interfacial reaction between metal thin films and semiconductors, and its applications in ultra large scale integrated circuits.